Professor Jeffrey Hopwood earned
a Ph.D. in Electrical Engineering from Michigan
State University in 1990 where he studied electron cyclotron resonance
plasmas. He also received the M.S. and B.S. degrees from MSU in 1987 and
1985, respectively. He joined IBM at the T. J. Watson Research Center in
1991 as a Post-Doctoral Fellow in the Advanced Materials Laboratory.
Following this Post-Doc, he joined Northeastern University in 1993 and
was promoted to the rank of full professor in 2006. He became a member of
Tufts' Electrical and Computer Engineering Department in September 2006.
Dr. Hopwood has worked primarily in the fields of plasma processing and
plasma source design. His current research interests include
microplasma-based environmental sensors and novel plasma processes for
the fabrication of nanoscale devices. Other research interests are plasma
etching and deposition processes for integrated circuit fabrication,
ionized physical vapor deposition (I-PVD), and plasma deposition of
Dr. Alan Hoskinson is a Research Professor in the department
of electrical and computer engineering.
He earned the Ph.D. in Nuclear Engineering and Engineering
Physics, with a minor in Electrical Engineering from the University of
Wisconsin in 2009 where he studied DBD plasma actuators. He is currently examining microplasma
physics and applications.
investigating the internal structure of microplasmas using various
diagnostic methods including laser diode absorption. He is also studying the interaction of microwave
energy with microdischarges. For
his MS degree he worked in plasma-enhanced atomic layer deposition
methods for nanoelectronic devices. He is particularly interested
in the role that inert-gas metastable atoms play in the desorption of
hydrogen from semiconductor surfaces.
Chen Wu is a Ph.D student
investigating the stability of long linear arrays of microplasma. We don’t have his picture yet, so we’re
showing you his 110-mm long array of atmospheric pressure argon
Jun Xue's research investigates
the charging and concentration of environmental nanoparticles using a
microplasma trap. These trapped nanoparticles can then be detected
and sorted using more conventional methods. This capability is
essential as a diagnostic
tool for both nanomanufacturing processes that are expected to produce
close-tolerance nanoparticles and as an environmental monitor. Dr. Xue is currently a researcher at
Agilent Labs in Santa Clara, CA.
Bu is studying
the fundamental properties of helium microplasmas, including the effect
of electric field frequency on electron density and optical
emission. These microplasmas are used as excitation sources in
analytical chemical instrumentation, such as atomic emission
spectrometry, mass spectrometry, and gas chromatography. Vince is now a Senior RF & Electronic
Engineer at Finisar.
James Pringle's research involves
designing a microcontroller controlled RF source and control scheme for
driving a microstrip split ring resonator. The RF source will
maintain the microplasma produced by the resonator in a stable state by
adjusting the drive power and frequency. A stable microplasma
source could be used in portable gas analysers or other
applications. James is currently
working at Draper Laboratory in Cambridge, MA.
an undergraduate research assistant who used Stark broadening of optical
emission to measure electron production by an atmospheric pressure helium
microplasma. He is also the lab's webmaster. Chandler is now a PhD student in the
Renewable Energy and Applied Photonics Lab of Prof. Vandervelde at Tufts